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UCHEM - Your trusted source for 3-Fluorobenzoic acid CAS 455-38-9.
We are excited to introduce our premium quality 3-Fluorobenzoic acid, a key ingredient for your research and development needs. With CAS:455-38-9, our product is guaranteed to meet your highest sta...
Glycine stock available
UCHEM is a premium supplier of glycine in industrial, food and pharm grade.Currently, there are approximately 20 amino acid-based products and their derivatives in warehouses.What App: +86-18930848...
Discover the secret of Amino Acid Surfactants in Green Cleaning Solutions
Amino acid surfactants offer a wide range of benefits that set them apart from their counterparts. Not only are they gentle on the environment, but they also have minimal toxic side effects and are...
Introducing our New Eco-Friendly Amino Acid Surfactants from UCHEM!
Amino acid surfactants is a new generation of green renewable surfactant derived from biomass.These surfactants are the upgraded and environmentally friendly alternative to traditional surfactants....
Introducing our New Eco-Friendly Amino Acid Surfactants!
Amino acid surfactants are gentle yet effective cleansers derived from natural sources like coconut oil and sugar beets.It is a natural, bio-based ingredients that are safe, eco-friendly, and gentl...
We supply the following amino acid surfactant products
Amino acid surfactants are made from coconut oil cas:8001-31-8 (or palm oil cas:8002-75-3 or laurel oil cas:8006-78-8) amino acids (such as glutamic acid cas:56-86-0, glycine cas:56-40-6, etc.) sal...
Introducing our High-Quality Zirconium Amino Metal Compounds for Advanced Thin Film Deposition Processes
Our company launches a series of high-quality zirconium amino metal compounds, specifically designed for use in advanced thin film deposition processes such as CVD, ALD, and PEALD. These compounds ...
Buy high quality Zirconium Amino Metal Compounds from UCHEM
zirconium amino metal compounds are specifically designed for use in CVD, ALD, and plasma-enhanced atomic layer deposition (PEALD) processes, making them ideal for growing ZrO2 precursors. Our pro...
Discover Our High-Quality Hafnium Amino Metal Compounds for CVD and ALD Applications
Introduce our company's high-quality hafnium amino metal compounds, which are essential materials for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These compounds se...
Revolutionize Your Thin Film Deposition Process with Our High-Quality Hafnium Amino Metal Compounds
Hafnium amino metal compounds are essential precursors for depositing hafnium and preparing hafnium oxide films. Our products, including Hafnium tetradimethylamide CAS: 19782-68-4,Tetrakis(diethyla...
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